Product Description

The wafer vacuum annealing furnace is mainly used for low-temperature annealing of semiconductor wafers in high vacuum environments.

Size: 4-8 inch wafer

Wafer Boat: Standard 25 pieces

Temperature control accuracy: ± 3 ℃

Heating rate: 10 ℃/min

Cleanliness level: Class 100 cleanliness

Vacuum degree: 5 * 10-4 Pa

Operating temperature: 200-550 degrees Celsius

Payment Terms︰ TT

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